All‐Amorphous Junction Field‐Effect Transistors Based on High‐Mobility Zinc Oxynitride

نویسندگان

چکیده

This report is on the electrical properties of all-amorphous junction field-effect transistors (JFETs) based n-type zinc oxynitride (ZnON) as a channel material and room-temperature deposited p-type ZnCo2O4 (ZCO) heterojunction gate. Devices with different thicknesses are thereby compared. Best devices 48 nm layer thickness achieve drain current on/off–ratios 105 low subthreshold swing 134 mV dec−1 within gate voltage sweep less than 2 V. The mobility extraction reliable for 90 nm-thick channels yielding saturation values over 50 cm2 V−1 s−1. For JFETs an overestimation due to deviations from ideal transistor characteristics determined.

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ژورنال

عنوان ژورنال: Advanced electronic materials

سال: 2021

ISSN: ['2199-160X']

DOI: https://doi.org/10.1002/aelm.202000883